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Dokument Nr.200303520 (klicken Sie bitte auf die Dokumentnummer um dieses Dokument anzuzeigen)
TitelSynthesis, characterization and properties of copolymers prepared in dense carbon dioxide towards the development of a 157 Nm photoresist
AbstractGiven the necessity for fluoropolymer based photoresists and the poor solubility of these materials in traditional organic solvents, CO(2) provides an attractive alternative for the synthesis, application, development, and stripping of photoresists. Furthermore, aqueous development of small images has led to image collapse due to the high surface tension of water. CO(2) provides a means by which to prevent this image collapse. In order to achieve this goal, new materials must be designed which are CO(2) soluble and possess a solubility contrast that can be activated by 157 nm radiation. By simply altering temperature and pressure, a variety of CO(2) densities can be obtained. Therefore, the photoresist must be soluble at one density, then following exposure, must be soluble at a different density. Finally, the entire polymer can be stripped at a higher density. This work seeks to summarize recent synthetic efforts in CO(2) towards the development of a 157 nm photoresist for use in CO(2). The materials that were prepared are the baseline backbones for future functioning photoresists. (orig.)
Control terms engl.YIELD; CHLOROTRIFLUOROETHYLENE; COPOLYMERS; FLUOROPOLYMERS; GEL CHROMATOGRAPHY; GLASS TRANSITION TEMPERATURE; HEXAFLUOROPROPYLENE; CALORIMETRY; CATALYSTS; CARBON DIOXIDE; CONCENTRATION; LAURIC ACID; LITHOGRAPHY; MOLECULAR WEIGHT; NMR; NORBORNENE; SURFACE TENSION; PEROXIDES; RESISTS; STRUCTURE; VINYLIDENE FLUORIDE
Control terms germanAUSBEUTE; CHLORTRIFLUORETHYLEN; COPOLYMERE; FLUORPOLYMERE; GELCHROMATOGRAPHIE; GLASTEMPERATUR; HEXAFLUORPROPYLEN; KALORIMETRIE; KATALYSATOREN; KOHLENDIOXID; KONZENTRATION; LAURINSAEURE; LITHOGRAPHIE; MOLEKULARGEWICHT; NMR; NORBORNEN; OBERFLAECHENSPANNUNG; PEROXIDE; RESISTS; STRUKTUR; VINYLIDENFLUORID